Used GILITEK IBS-1030-V2 #9395807 for sale

GILITEK IBS-1030-V2
ID: 9395807
Ion Beam Sputtering (IBS) system PPG 16RF Ion source FERROTEC HSF BROOKS On-Board 400 Cold pump OSAKA FR060D Mechanical pump BROOKS High and low vacuum gauge ALICAT Flow meter VAT High vacuum valve ORIENTAL MOTOR Target motor ORIENTAL MOTOR Mask drive motor ORIENTAL MOTOR Shutter motor Coating machine controller.
GILITEK IBS-1030-V2 is a sputter deposition equipment designed for advanced thin film fabrication. It is a fully automated system, with easy-to-use software and hardware controls. The unit provides advanced precision thin film deposition capabilities, including a variety of thickness control options. It is suitable for use in semiconductor and other thin film applications. IBS-1030-V2 comes equipped with a four-axis robot arm, an X-Y stage, and three sputter sources. This combination enables it to perform advanced directional sputter deposition. This machine is capable of making thin film depositions in any direction of up to 25 microns thick with a ALD thickness control accuracy of +/- 5% (volumetric). The tool is offered with two or three targets and each of these may be controlled independently. GILITEK IBS-1030-V2 is controlled by GILITEK Graphic User Interface (GUI). This GUI is easy to use and customisable, allowing for efficient thin film deposition parameters to be set at the push of a button. By using this interface, operators can quickly set up deposition recipes, monitor the asset status, and examine sample images during growth. The software also allows for parameter-based deposition and scheduling, Automatic End-Point Detection (AED), Plasma Control (PC) mode control, thickness control (TC) mode control, the ability to upload images for process/application monitoring and corrections, and the ability to compare deposited film properties with a flat reference. IBS-1030-V2 features ultra-pure deposition gases, robust vacuum pumps, and provides process flexibility and durability. The model has PLC input/outputs capability for high process repeatability, a multi-coolant equipment design for reliable sample temperature control, and an integrated e-Beam shaped thin film deposition system. The e-Beam improves process results through improved homogeneity and high step coverage capabilities. In addition, the unit offers industry-leading safety features and has a low maintenance design. An easy-to-install air-cooled exhaust filtration machine, adjustable shutters, and remote shutdown capability provide users with added convenience. GILITEK IBS-1030-V2 is an advanced sputtering tool designed to provide precise and high-quality thin film deposition capabilities for many applications. This asset is fast, reliable, and easy to use, making it a great choice for researchers looking for high-precision and high-performance thin film deposition.
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