Used GILITEK IBSV-1030-V2 #9070264 for sale
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ID: 9070264
Ion Beam Sputtering (IBS) system
Targets: 2 / 4
Optical monitoring system
Cryo pump: SHI / CTI
Dry pump
Front / Back heaters
Coating temperature: 200ºC
Coating area: φ350 mm
(4) Planetary substrate holders, 6"
Target position: Adjustable program control during coating
Adjust shadow mask
Coating jig: Face down on chamber top / On chamber door
Feedback control for film thickness uniformity
Support substrate with and without center hole.
GILITEK IBSV-1030-V2 sputtering equipment is an all-in-one source of physical, chemical, and thermal processes for advanced material research. IBSV-1030-V2 comes equipped with two power supplies, a deposition source, vacuum, cryo-pumping, and four independent sputter and evaporation sources. This system is capable of producing films with a thickness up to 5,000 angstroms and conformal coverage of up to 80%. GILITEK IBSV-1030-V2 utilizes a standard high-vacuum chamber rated for 1x10 Torr and equipped with a powerful diffusion pump, capable of achieving an operating base pressure of 1x10-7 Torr. An independent view port, 4-way manipulator, and auto-balancing unit allow for accurate control and positioning within the chamber. The physical sputter deposition is enabled through the four independent sources. The sources are configured to support both planar as well as conformal deposition of metals and oxides. The machine is capable of producing films with thicknesses from a few Angstroms to several microns with superior adhesion on various substrates including silicate glasses and polymers. The chemical vapor deposition (CVD) capabilities are enhanced by the introduction of the new vapor source. This vapor source is capable of depositing Metal Organic Chemical Vapor Deposition (MOCVD) films, such as GaN or MoS2, as well as other materials such as polymers and carbon nanotubes. It also supports sublimation and chemical assistance depositions of a variety of other materials with adjustable flux and temperature control. The thermal capabilities are enabled via an external heating element with adjustable power and temperature. This allows for a variety of processes such as annealing and rapid thermal processing. Overall, IBSV-1030-V2 is suitable for a variety of research applications including deposition of thin films, CVD deposition, and thermal processing of materials. The tool is capable of producing high quality films with optimal adhesion and conformal coverage. The advanced hardware, coupled with advanced software, offers an outstanding degree of control and flexibility when it comes to complex processes. With the ability to support a wide variety of applications, GILITEK IBSV-1030-V2 is an ideal asset for research institutions and industries alike.
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