Used GILITEK IBSV-1030 #9222698 for sale

Manufacturer
GILITEK
Model
IBSV-1030
ID: 9222698
Vintage: 2014
Ion Beam Sputtering (IBS) systems Substrate size: Diameter, 12" CTI 400 Cryopump PPG 16 cm RF ion source RF Ion source: 12 cm (4) Targets: 14" x 10" Ion source distance: Adjustable (±25mm) In-situ optical monitoring system OSAKA Dry pump FERROTEC HSF (8) Shadow masks BROOKS Vacuum gauges VAT Gate valve Full automatic program controlled (2) Lamp heaters 2014 vintage.
GILITEK IBSV-1030 is an innovative sputtering equipment designed for a variety of applications. It is designed to work with high level of efficiency and precision, making it an ideal solution for many industries. The system comes with a transmission magnetron sputtering target which is capable of sputtering a variety of materials from oxides to special alloys. The sputtering target area is 10 x 30 inches which makes it an excellent choice for larger sputtering applications. Its low power requirements allow it to be used in a variety of settings including high deposition rate and mass production. IBSV-1030 also features a clamping unit for easy and secure operation. It comes with adjustable power supply and adjustable sputter current which allows for superior control and adjustment of the sputter process. The backside cooling allows it to be used in a variety of environments and substrates. GILITEK IBSV-1030 is a versatile machine that offers advanced capabilities, including a vacuum level of 0.3Torr to 10Torr, adjustable film thickness up to 33 micrometers and an adjustable sputter rate up to 24mm/min. It also features adjustable deposition temperature and adjustable work height. Additionally, IBSV-1030 comes with a fully automatic function which allows it to be used for unattended operations. GILITEK IBSV-1030 is designed to reduce particle contamination from its sputter process, enabling better control of product quality. It also features low maintenance requirements, ensuring consistent performance with minimal downtime. IBSV-1030 is a reliable and efficient tool for a wide variety of sputtering applications. It is designed for controlled vacuum conditions with easy operations. This makes it an ideal choice for various industries looking for a strong sputtering asset with great performance and efficiency.
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