Used GILITEK IBSV-1030 #9354747 for sale

GILITEK IBSV-1030 is a high performance, precision engineered sputtering equipment designed for top-of-the-line processes. It features a vacuum-based deposition system with up to four rotating-gun sputtering sources and a built-in cooling unit to ensure consistent, repeatable results. The rotary-magnetron gun features are designed to produce precise, high-quality films with minimal defects. With its wide-range of processing gases and pressure control, IBSV-1030 can achieve exceptional film uniformity and composition, and its advanced controls give operators ultimate process control and long-term machine stability. GILITEK IBSV-1030's design provides stable temperature control and very low scatter. Its integrated and advanced PLC controller allows users to easily monitor, control and customize the vacuum tool parameters. The asset is highly configurable and can be scaled up to meet various application requirements. It features an all-in-one operating platform and supports RTOS automated control, with calibration and pre-set parameters via Ethernet. In addition to the main sputtering model, IBSV-1030 comes with an array of accessories and components for precise preparation and post-processing. It includes an automatic drive plate positioning equipment, sputtering heads, turbo pumps, high-voltage power supplies, RF generators, and other components to ensure optimal performance in each stage of the process. GILITEK IBSV-1030 is designed for high performance deposition processes and comes with a number of optional features. These include automatic gas control for precise gas flows; high- speed substrate transport systems; and sputter target holders, motors, and chambers for the deposition of single or multilayer films. It includes an advanced, real-time monitoring and control system for quality assurance and data logging. In summary, IBSV-1030 is a high-performance sputtering unit designed for precise, repeatable results. It offers advanced process control, stable temperature control, and minimal scatter to ensure optimal performance in each stage of the process. With its optional features and components, operators can easily customize the machine to meet the requirements of any application.