Used GILITEK IBSV-1030U #293633037 for sale

GILITEK IBSV-1030U sputter equipment is a compact modular sputtering system designed for the deposition of thin films for a range of applications such as optical, structural, MOCVD, dielectric and magnetic thin films. This versatile unit has user-friendly options such as computer memory banks that can store up to 30 user-defined recipes to recall at any time, as well as 4 programmable shutter units with uniform deposition modes. IBSV-1030U has various construction elements such as a power source, a high frequency generator, a vacuum chamber, a manipulator and an automatic measurement machine. The power source provides the energy required for sputtering process, resulting in an even deposition of thin films over the target surface. The high frequency generator hastens the sputtering process and allows for intricate thin film structures with clean brick surface and low surface roughness. The chamber of GILITEK IBSV-1030U features a unique three-dimensional magnetron field that ensures uniformity of deposition. IBSV-1030U also has an integrated manipulator, which can easily locate and precisely manipulate the substrate within the chamber for accurate and repeatable targets on the surface. This ensures that the film that is deposited will be uniform and homogenous. Additionally, GILITEK IBSV-1030U has an exchangeable viewport, which can be used to observe the entire deposition process. The tool is also characterized by low maintenance cost, reliable performance and low noise level, which make it a desirable choice for research and industrial operations alike. IBSV-1030U also includes an automatic measurement asset to monitor the deposition process and make the necessary corrections if required, resulting in high-quality thin film deposition. The model also features process monitoring capabilities, allowing users to track the history of deposition and evaluate the results. Overall, GILITEK IBSV-1030U is a cost-effective, easy to use and versatile equipment designed for reliable sputter deposition. Its adjustable parameters, automated measurement system and integrated manipulator ensure uniform deposition of thin films, making it ideal for a variety of applications. It offers superior sputtering performance, low noise level and low maintenance cost, which make it suitable for both research and industrial environments.