Used HITACHI E-1010 #293597935 for sale

HITACHI E-1010 is an advanced PVD sputtering equipment that combines superior technology with user-friendly operation. HITACHI E1010 includes a high-power microwave magnetron sputtering gun capable of producing films with exceptional properties, even on difficult substrates. Sputtering is a physical vapor deposition process that relies on the bombardment of a target material by energetic particles such as ions or atoms. This bombardment causes atoms of the target material to be ejected onto the substrate to form a desired film. E-1010 utilizes high-frequency, high-power pulsed magnetron sputtering for uniform and reproducible results. The gun is capable of single and simultaneous multi-layer deposition using up to four independent power systems. The power systems are variable from 0-100%, giving users the ability to vary film properties over a range of different values. This flexibility allows for films with a range of properties such as low surface roughness, superior adhesion and optical reflectance. E1010 has a two-stage pressure control system consisting of an external vacuum chamber with an internal pressure chamber. This unit is designed to minimize contamination and prevent outgassing problems during deposition. The machine comes equipped with an electron current measurement device for accurate deposition rate control and composition monitoring. HITACHI E-1010 can handle sample sizes up to 200mm, making it suitable for a wide range of applications. It can also be used to deposit thin films on various substrates such as glass, quartz, silicon and metal. HITACHI E1010 includes a remote monitoring tool for monitoring of pressure, temperature and other parameters during deposition. The asset is Windows compatible and features a user-friendly, intuitive graphical user interface. The intelligent model is programmed to provide rapid command recognition and prompt execution. E-1010 features a intuitive process recipe editor that allows users to customize processes and save them for future use. E1010 is an excellent choice for applications such as semiconductors, thin-film transistors, data storage devices, solar cells and fuel cells. HITACHI E-1010 can be used to deposit thin films of metal, metal oxides and combinations of materials. HITACHI E1010 delivers repeatable, consistent results, making it a great choice for any PVD requirements.