Used HITACHI E-1010 #293604647 for sale

Manufacturer
HITACHI
Model
E-1010
ID: 293604647
Vintage: 2008
Ion sputtering system 2008 vintage.
HITACHI E-1010 is a sputtering equipment designed for metal and metal oxides thin film deposition. It is widely used in research areas such as precision microelectronics, optoelectronics, nanotechnology and materials science. This system generally consists of two main components: the sputtering chamber and the physical vapor deposition (PVD) source. The sputtering chamber is a hermetically sealed chamber with a vacuum pressure of less than 8x10-5 mbar. It contains chambers for processing and material transfer, a rotating sample table, a collimator, a massive filter, and a stationary pedestal. The sample table can hold up to five four-inch substrates and can be heated up to 350 °C. A collimator is used to focus the sputtered ions towards the substrates placed on the rotating table. There is a massive filter installed to filter out unstable gas molecules created during the sputtering process. The PVD source of HITACHI E1010 is powered by a high-voltage 25 A DC power supply and a pair of N2/O2 gas feed systems with gas valves. The PVD source can be used to sputter up to five different target materials simultaneously and generate a wide range of sputtered ion energies from few eV to several keV. It can sputter films of aluminum, chromium, iron, gold, and even silicon-based materials. E-1010 has a unique feature called a "uniform flux distribution" that ensures that all the substrates placed on the rotating table get evenly sputtered ions. Moreover, its cooling unit with large chamber surface area and cooling water circulation helps to maintain a stable temperature during operation. The machine also features various safety features such as leak detection, pressure regulation, remote control, and data logging. In conclusion, E1010 is a highly advanced and reliable sputtering tool with excellent features perfect for research and development activities. With its precise ion sputtering technology, uniform flux distribution, temperature regulation, and safety features, it provides a world-class platform for users to carry out their research tasks with ease.
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