Used HITACHI E-1010 #293638499 for sale

HITACHI E-1010 is a state-of-the-art sputtering equipment used in laboratories for a variety of research and development applications. The system is an enclosed unit that is capable of handling vacuum substrate deposition from both sides of a substrate, with plans for growth and expansion of the unit to larger, more complex substrates. It is equipped with a state-of-the-art electrostatic shield for low-voltage and low-intensity diffusion of ions and particle trajectories, providing superior protection to sensitive substrates and components. The sputter gun incorporates a graphite liner that has a large number of graphite arc-filaments, which provide a uniform and smooth transition of the sputtered material. The arc-filaments extend throughout the gun, providing an even sputtering operation. The sputter gun incorporates a dual point section featuring a four-electrode machine which is capable of providing high-current, high-pulse-rate, power deposition. Designed specifically for small and large particles, this tool provides ultra-fast coating performance with minimal warming of the components. HITACHI E1010 also includes a double-ended etching function that provides both parallel and cross-section etching. This allows for the precise analysis and inspection of the substrate or component after the sputtering process. This asset also includes a robotic arm that can operate in three-dimensional space, allowing for easy adjustment of the substrate table and simple access to the sputter gun from any angle. E-1010 is a fully automated sputtering model, with planning and monitoring capabilities, automation for the gun and overall substrate management, and a user-friendly graphical user interface (GUI). Its flexible, easy to use software also allows for data entry and recording, with adjustable sputter parameters and overall equipment management. It also features independent batch management and recipe management, as well as real-time pressure and temperature management. Most notably, E1010 features advanced diagnostics through a laboratory-grade Pressure Monitor II system. This unit provides accurate pressure feedback and displays the optimum sputter conditions at all stages of the process. Additionally, the machine can be operated on either a vacuum chamber or a bayonet-style sputter gun, making it adaptable to various types of substrate deposition. Overall, HITACHI E-1010 is an advanced sputter tool that provides precise and repeatable results for a variety of applications. With its powerful sputter gun, simultaneous etching integration, automation capabilities, and pressure monitoring functions, it is a comprehensive and comprehensive asset for precise substrate deposition.