Used HITACHI E-1010 #9284034 for sale

HITACHI E-1010 is a fully automated sputtering equipment designed for thin-film deposition applications. It is equipped with a sputter head chamber, a substrate chamber, an electrode assembly, a power supply, and a controller unit. The system is capable of producing ultra-thin films of good quality and provides excellent value for money. It is suitable for applications in thin-film deposition, deposition of transparent conductive oxides (TCOs), and oxide/metal layers. The sputter head chamber is designed to provide a perfectly uniform film deposition over the area of the substrate. It is fitted with an adjustable ion gauge for controlling the pressure in the chamber and a proximity monitoring vacuum gauge. The substrate chamber is used to keep the substrate in the position of optimal view while the deposition is carried out. It is equipped with a shutter for providing the most uniform film deposition on the substrate. The electrode assembly includes two electrodes, one of which is the source and the other the target. A power supply is used to supply the electrical energy to the electrodes to enable the sputtering process. The controller unit provides the control signals for the sputter head chamber, the substrate chamber and the electrode assembly, ensuring precise and homogenous film deposition. HITACHI E1010 unit offers a variety of benefits for sputtering operations. It has a maximum sputtering rate of up to 0.25 pair/min and a maximum deposition rate of 8nm/min, making it an ideal sputtering machine for high throughput. Furthermore, the robust design provides good stability over time and guarantees excellent performance in applications such as multi-layer deposition, ultra-thin film deposition, and transparent conductive oxides (TCOs) deposition. The flexible configuration options are especially useful for custom applications. E-1010 Sputtering Tool is a powerful and reliable asset for sputtering operations that provides excellent cost effectiveness, making it an excellent choice for a wide variety of thin-film deposition applications. It offers a good combination of performance, quality, and value for money, making it a great choice for anyone in the thin-film deposition industry.