Used HITACHI E-1010 #9379359 for sale

HITACHI E-1010 Sputtering Equipment is a versatile, high-precision sputtering device designed for thin-film deposition applications. It is an economical and highly automated tool that can be used for both research and production level applications. HITACHI E1010 is a scalable system, offering solutions for deposition of metals, oxides and nitrides. The unit features a 7-axes robot arm that allows for uniform layers of material to be deposited on substrates of varying size and shape. With a maximum substrate size of 192 mm x 192 mm and a maximum substrate weight of 30kg, E-1010 can handle various substrates including rigid, flexible and curved parts. High aspect ratios of up to 5:1 can be achieved and support for multi-layer confocal sputtering is offered. E1010 machine is equipped with a plasma-enhanced sputtering source. This allows for increased deposition rates, leading to higher throughput and improved substrate coverage. The sputtering source can also be used to deposit multiple layers in a single deposition step, advancing the tool's versatility further. TheE-1010's sputtering asset offers a wide range of process control parameters for target selection, film thickness, etching and deposition rates. Automated recipes can be stored and recalled for more efficient operations, and real-time monitoring of target erosion and film thickness is possible. HITACHI E-1010 supports multiple chamber configurations, allowing for the simultaneous operation of multiple sputtering sources. Built for reliability and easy expandability, HITACHI E1010 features a compact and robust frame with a modular design. The model also allows for customization with a selection of accessories, such as micropositioners, electron guns, and substrate-handling systems. Overall, E-1010 Sputtering Equipment is an affordable and versatile sputtering tool designed for applications where high precision and reproducibility are required. The system is easy-to-use, reliable and offers fast processing speeds. Additionally, the unit supports multiple configurations, making it ideal for a wide range of thin-film deposition applications.