Used HITACHI E-1030 #293638501 for sale

HITACHI E-1030 is a sputter deposition equipment designed to create high-quality thin films and coatings on surfaces in a variety of industries. This system consists of a sputter gun assembly, a controller, a substrate holder, and a process chamber. The sputter gun assembly consists of an anode, a cathode inside the process chamber, and a vacuum pump. The anode is constructed of copper, containing an internal filament, and is heated to 1500°C to 2500°C by electron bombardment. The cathode is fabricated from a target material and is heated by the electron bombardment from the anode to temperatures of 1000°C to 1 500°C. The substrate holder is attached to the process chamber and is responsible for holding the substrate in place during the sputter deposition process. The controller is used to adjust the pressure, voltage and current settings in order to adjust the deposition rate. The process chamber is a sealed environment that can be adjusted to generate a partial or complete vacuum in order to facilitate the sputtering process. E-1030 provides a variety of design features for optimal results, including a high-instantaneous deposition rate, excellent uniformity across the substrate due to a homogeneous field, and the ability to work with a variety of materials such as metals, oxides, and ceramics. The unit is also designed to be user-friendly and easy to operate. It has a simple control panel and digital display for viewing the process parameters and changing settings as needed. Furthermore, it is energy efficient and cost effective, making it an attractive option for vacuum deposition processes. In addition to its design features, HITACHI E-1030 can also perform a variety of sputter techniques such as high power impulse magnetron sputtering (HIPIMS) and pulsed glow discharge (PGD). HIPIMS provides a higher deposition rate than other sputtering methods while maintaining a high-quality, uniform coating over the substrate. PGD is ideal for low-temperature applications and can be used to create dense and conductive coatings. These two sputter methods, along with all of the other deposition capabilities of E-1030, make it a powerful tool for achieving the desired outcome in a variety of industrial processes. Overall, HITACHI E-1030 is a reliable, user-friendly sputtering machine suitable for high-quality thin film deposition processes in various industries. With its advanced design features, efficient operation, and versatile sputter techniques, this tool is an ideal tool for achieving desired outcomes in the most cost effective and energy efficient manner possible.