Used HITACHI E-1030 #9117361 for sale

HITACHI E-1030 Sputtering Equipment is a specialized piece of equipment designed for particularly delicate work. It sputters a variety of different materials onto substrates including metals such as gold, aluminum, chromium, copper, and titanium, as well as other materials such as silicon and silicon dioxide. The system uses a high-density electron beam gun to ionize the gases of choice, and then accelerates the ions onto the surface of the substrate. This technology allows for the re-deposition of the target material in a precise and consistent manner, giving operators the highest level of control over the process. The unit features a closed-cycle vacuum chamber to ensure a clean and contaminant-free environment, protecting the valuable substrates. It has a base pressure of 1 x 10-5 mbar, and a maximum processing temperature of 350°C, making it suitable for a variety of delicate processes. It is also equipped with an onboard gas filter, allowing operators to quickly and easily filter a variety of different gases. The machine has a variety of controls to ensure precise processes. For example, it utilizes an adjustable power source that allows for the exact regulation of the gun's ionization power. This allows for the deposition of a thin or thick film with a very small deposition error. It also has a programmable deposition rate with a frequency of 0.01 to 100 Hz, allowing operators to fine-tune the deposition rate of the substrate. E-1030 Sputtering Tool is a reliable piece of specialized equipment, perfect for large-scale production or other more intricate projects. It is an ideal solution for thin film deposition applications, with the precise control it provides. Its robust design and clean operation make it an excellent choice for any process where reliable and consistent results are required.