Used HITACHI E-1030 #9254425 for sale

HITACHI E-1030 is a high-performance sputtering equipment used for evolving metal, semiconductor, or oxide thin films. A sputter is a process used to deposit thin films on substrates by impacting them with energetic particles. This system employs an Ion beam assisted process to increase deposition rates and improve film uniformity. It is capable of generating highly precise thin films for displays, solar cells, MEMS, and other electronic components. E-1030 includes a low-impedance radio frequency (RF) power supply, an optical monitoring unit, and an ultra-high vacuum (UHV) chamber. The RF power supply provides a powerful current source, enabling the entire process to be completed in a higher vacuum than is normally achievable. This improves the structural and optical quality of the films deposited. The optical monitoring machine includes cameras attached to each substrate stage, allowing real-time observation of the deposition process and precise control of the sputtering process. The UHV chamber of HITACHI E-1030 uses a fast-refrigerated turbo molecular pump and a combination of oil and SUS316L electrodes to minimize contamination. This ensures an extremely clean atmosphere is maintained during the deposition process. The chamber is designed to maintain a base pressure of 5.0 × 10-9 Torr, and can maintain a clean vacuum for up to 24 hours. E-1030 uses four uniform loads to distribute the impact force of the sputtered ions. This ensures excellent material uniformity from substrate to substrate. The loads can accommodate substrates up to 140mm in diameter and can hold substrates as thick as 3mm. The tool features four independent targets, allowing for the sputtering of four different materials at the same time. HITACHI E-1030 is capable of performing automated recipes to precisely define the deposition conditions for a given film. This allows for repeatable deposition results and ensures a reliable production quality. It also features a self-monitoring asset which will detect model errors and send alert messages to the operator. Overall, E-1030 is a high-performance sputtering equipment which delivers exceptional material uniformity and repeatable deposition results. It is ideal for metals, semiconductors, and oxide thin films, and is the perfect choice for creating displays, solar cells, MEMS, and other electronic components.