Used HITACHI E-1030 #9377261 for sale

HITACHI E-1030
Manufacturer
HITACHI
Model
E-1030
ID: 9377261
Vintage: 1996
Ion sputter 1996 vintage.
HITACHI E-1030 is a high-performance DC hybrid sputter deposition equipment that offers a combination of speed, uniformity, and process flexibility. It is a powerful tool for sputter deposition of thin films onto substrates such as semiconductors, glass, and other materials. At its core, E-1030 uses high-frequency AC/DC power switching and a linear DC/DC converter for power regulation. This powerful system is capable of delivering up to 1.5kW of sputter power across five sputter sources, each with an adjustable target power level from 0.5 to 200W. The unit also features an optional automatic target power control for uniform film deposition. HITACHI E-1030's unique linear DC/DC converter also allows for adjustable sputter deposition rates from 0.1 to 100 nm/min. The machine is capable of producing oxides, metals, and other materials with a high degree of conformal coating and feature definition. E-1030's adjustable sputter sources are designed to provide uniform deposition of thin films regardless of the substrate size. The tool's auto-target power control feature ensures that depositions occur at the proper target power level regardless of the substrate size. HITACHI E-1030's multi-zone capability allows users to sputter separately on multiple locations or areas within the same substrate. The asset also includes an automatic alignment model for accurate targeting and deposition of thin films onto substrates. E-1030 is constructed to offer qualitative deposition rates and enhanced process control. Its automatic interlock equipment ensures process stability and process repeatability. The system's integrated control panel displays the deposition parameters in real-time, enabling fast and uniform process control. Additionally, an advanced real-time monitor unit allows for process data review and process optimization. HITACHI E-1030 is a highly versatile machine that is ideal for a wide range of sputter deposition applications. With its high current, high throughput rates, fast power switching, and flexible process control, E-1030 is a great choice for sputter deposition.
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