Used HITACHI IML6-1 #9172028 for sale

HITACHI IML6-1 is a high-performance sputtering equipment for coating materials and creating thin film devices. It features a full 6-axis mechanical stage and a vacuum chamber, which can be operated in either the horizontal or vertical orientation. The system also has a variety of substrate holders to accommodate a variety of substrates, such as glass, metal, plastic, and ceramic. The unit utilizes a low-voltage, low-energy ion accelerator, with beam currents up to 1mA rms and a wide beam spot size of 30 mm. The adjustable beam energy, coupled with advanced high-density plasma control, allows for the efficient deposition of various metallic, dielectric, and composite thin films using an array of sputter sources. IML6-1 is designed to deliver superior quality coating processes with low defect levels. Its advanced chamber and source design ensures uniformity of coverage by controlling the uniformity of the plasma density and energy density of the sputtered particles, as well as metallic adhesion and film homogeneity. Additionally, it is equipped with an advanced plasma monitoring machine, which precisely controls the plasma positioning and process uniformity. The tool also includes state-of-the-art systems for controlling vacuum pressure, oxygen content, gas injection, and temperature. This allows operators to closely monitor the process and ensure optimal process results. HITACHI IML6-1 is equipped with an intuitive graphic user interface, which makes it easy to use and allows users to quickly and easily monitor and adjust the asset parameters. It is also supported by extensive online documentation, including troubleshooting guides, operating instructions, and usage tips. IML6-1 is an ideal choice for projects that require superior sputtering performance under tight control. Its superior substrate wear protection and plasma control technology help it deliver reliable quality films, even with highly demanding materials.