Used INNOTEC DS 24 #2736 for sale
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ID: 2736
Diode Sputter System
14" round target, RF etch, can demo
Missing pumps, RF generator, turbo and controller
Unit is in storage.
INNOTEC DS 24 is a high performance sputtering equipment that is suitable for large and small targets. The sputtering system is powered by a 24kW DC target power supply, and is suitable for both production and research applications. It has an advanced process control and monitoring unit, making it easy to control and adjust the sputtering parameters. This ensures the process is repeatable and reproducible for consistent high quality results. The machine is capable of sputtering a variety of materials and can deposit thin films up to 100 nm thick. The versatile sputtering chamber can be configured with several targets, and is suitable for various sizes and shapes. The chamber is also equipped with adjacently located source and substrate holders, allowing a great amount of flexibility when positioning substrates and targets. DS 24 features multiple cooling options, including fast sweep and slow sweep cooling configurations. It also has a high precision EDAX EDXRF energy dispersive spectrometer which allows for rapid determination of the elemental composition of sputtered films. The EDAX tool also offers high speed analysis with its high speed spectrometer and a throughput of up to 15 samples per hour. The sputtering asset also has a dedicated vacuum model, which is equipped with an 18 m3/h turbo-molecular pumping station. This ensures that the cleanliness of the equipment is maintained, ensuring optimum working conditions for the thin film deposition processes. Furthermore, INNOTEC DS 24 provides intelligent alarming and monitoring systems, allowing early detection of system faults and leaving time to rectify the issues before they become severe. It also has a collection of process monitoring tools, enabling researchers to optimize their processes and to fine tune their deposition parameters in order to achieve the desired results. Overall, DS 24 is an advanced yet user-friendly sputtering unit, offering reliable and repeatable process performance. It is suitable for demanding production and research applications, and its intelligent systems make it an invaluable tool in the thin film deposition field.
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