Used JM IOTA #129082 for sale

JM IOTA is a sputtering equipment designed to deposit both thin and thick films. The system is a dual magnetron sputtering unit which consists of two process chambers; one used for thin film deposition and the other used for thick film deposition. Each chamber contains its own cathode, power supply, plenum, and RF match. An Ultra High Vacuum (UHV) machine is incorporated into the tool to maintain the cleanliness of the chambers. This allows a wide range of materials to be deposited. The thin film deposition chamber is designed to be used for smaller substrates and for applications which require high purity, uniformity, and low particle contamination. It is capable of depositing materials from noble metals, alloys, and polymers in a wide range of thicknesses from sub-monolayer up to a few hundred nanometers. The thick film deposition chamber is designed for depositing thick layers of materials, usually from a few hundred nanometers up to several microns in thickness. Metal oxides, nitrides, and carbides can all be deposited in this chamber. The chamber is also adaptable to allow the deposition of an alloy material. Both chambers have adjustable temperature control systems, allowing the deposition rate to be precisely controlled over a wide range of materials. This allows uniform, repeatable coatings to be applied consistently over various substrates. In addition to the regular deposition chambers, IOTA also includes a chemical vapor deposition (CVD) asset which enables the deposition of nanocomposite films. The CVD model allows for the couple deposition of both inorganic and organic materials to create multi-functional nanocomposite films. Overall, JM IOTA sputtering equipment is an extremely versatile tool for the deposition of thin and thick films. The wide range of materials and processes it can accommodate provides users with the ability to create high quality films with minimal contamination.