Used JUANT TECHNOLOGY JUT-SHX-3033 #9112353 for sale

JUANT TECHNOLOGY JUT-SHX-3033 sputtering equipment is a system designed for sputtering, which is an important physical vapor deposition (PVD) process for the deposition of thin films. This unit is highly customizable for the production of various types of thin film materials and can be used for electronic, optical, and structural applications. JUT-SHX-3033 is an integrated sputtering machine with features that enable it to produce high quality films. It provides a controlled environment that simplifies the deposition process. The tool includes a vacuum chamber, transport platform, vacuum pumps, and various components to support the sputtering process. The vacuum chamber is equipped with a rotary cathode platform, a turbo molecular pump, and gas inlet/outlets. The transport platform allows for even, efficient, and repeatable sample transport and film deposition. The components included in the asset are various target holders, process cooling, an optical monitoring model, and shutter shutoff. The equipment is designed to be highly versatile, allowing users to sputter different materials at the same time. Target holders can be changed on the fly, allowing for the deposition of multiple materials onto a single substrate. This flexibility enables the production of a wide variety of thin films for electronic, optical, and structural applications. The system features an advanced control unit and a closed-loop feedback machine. This ensures accurate process control and repeatability of results. The tool is also equipped with a remote monitoring and control asset that allows for remote operation and analysis of the model from a secure location. JUANT TECHNOLOGY JUT-SHX-3033 is also designed to be highly efficient and to use fewer materials. Its closed-loop pressure regulation equipment ensures that no gases escape the chamber, which reduces material waste. This also results in superior film quality, improved production throughput, and low operating costs. JUT-SHX-3033 is an advanced sputtering system, designed to meet the needs of modern industry and research. It offers users a versatile and efficient platform for the production of high-quality thin films, for a wide range of applications. Its features make it ideal for production environments, ensuring high yields and repeatability.