Used KDF 903ix #9249504 for sale

KDF 903ix is a state-of-the-art sputtering equipment designed for deposition in various semiconductor fabrication processes. It is a three-target, dual-source, ultra-high-vacuum vertical-descent sputter system that enables the low-temperature deposition of films that are extremely uniform across the substrate. The unit features dual cathodes, each with three targets that are independently settable and viewable. The viewable targets also enable users to quickly identify which materials are sputtered and to which substrate the targets are aligned. The dual-source approach enables a uniform, low-temperature deposition across the substrate, while the vertically-descended approach reduces particle contamination. 903ix has a low-temperature sputter heating machine that enables users to sputter films at temperatures up to 500°C. It also has a high-average-power quenching tool, which provides faster, more even deposition for all processes. An extended lifetime crucible is used to keep particles at bay during deposition and robotic crucible sanitation asset to keep films clean and particle-free. The model has a single adaptable and scalable multi-zone power supply, capable of up to 1600 watts of total power, allowing for a wide variety of sputter options. Additionally, the equipment has the ability to compensate for substrate and target thermal-effects. KDF 903ix is also equipped with integrated process monitoring and control features, including thickness and electrical sheet resistance mapping capabilities for in-situ process monitoring. It is capable of precise positional control and sputter head alignment, ensuring that the target is always properly aligned with the substrate being processed. Overall, 903ix sputtering system is an advanced unit that is capable of providing uniform films of any material, on any substrate. It is capable of precise process optimization and control, meaning that users can achieve accurate, reproducible thin films with excellent uniformity.