Used KDF / EMITECH / EMCORE K350G #9075090 for sale

KDF / EMITECH / EMCORE K350G
ID: 9075090
Power supply Sputter coating / Glow discharge controller Plasma voltage: 0 to 1000 V variable DC at 100 mA Electrode polarity: +DC or -DC with aluminum electrode, 60 mm diameter Glow discharge lid Vacuum chamber glass: 165 mm diameter x 125 mm H HT Vacuum interlock Needle valve bleed control Instrument case: 230 mm W x 230 mm D x 175 mm H Power supply: 230 V, 50 Hz, 6 A max 115 V, 60 Hz, 12 A max.
KDF / EMITECH / EMCORE K350G sputtering equipment is an extremely versatile tool used for coating surfaces with thin layers of materials. KDF K350G is designed with a seven-chamber vacuum system and is able to create extremely consistent, uniform deposits at an optimal rate. The unit uses highly efficient and reliable magnetron gun power sources, as well as an advanced quartz in-situ monitoring machine. The chamber design is ideal for creating thick and uniform coatings of up to five inches (12.7 cm) and including materials such as tungsten, tantalum, and nickel chromium alloys. EMCORE K350G includes modular source holders which are designed to accommodate for both round and rectangular targets. The tool ensures effective material transfer to the substrate with low particle erosion, minimized emissions, and low power consumption rates. The sputter sources also exhibit strong reproducibility, which is imperative for uniform deposition. EMITECH K350G is designed to maintain a clean environment for sputtering, with three installed gas outlets for hydrogen annealing, purging, and inert gas. Its large working area provides the space necessary for coatings with longer working lengths and standard substrate holders for all substrates up to eight inches (20.3 cm) square. The asset is interfaced with a Mitsubishi robot arm and a cassette-style loader designed for better process integration. K350G is a powerful and reliable sputtering tool used to generate consistent, uniform coatings. Its seven-chamber design, high efficient power sources, precise in-situ monitoring model, and user friendly operator controls make this equipment an ideal solution for advanced sputtering applications. The system's modular source holders, gas outlets, working area, and robot arm make it exceptionally effective for achieving quality coatings of both thick and thin materials.
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