Used KDF / EMITECH / EMCORE K350G #9240958 for sale

KDF / EMITECH / EMCORE K350G
ID: 9240958
Power supply.
KDF / EMITECH / EMCORE K350G is a high-quality sputtering tool suitable for the deposition of thin films on large-area substrates. The equipment is composed of an electromagnetically-activated cathode which bombards the substrate with argon gas ions, enabling the deposition of thin films with a uniform coverage. The system has several advanced features which determine its effectiveness in thin film deposition. First, KDF K350G unit is equipped with a high power active magnetic field based on a superconducting electromagnet placed beneath the target surface. This enables the ion bombardment to be carried out with a high degree of precision, leading to uniform thin film deposition characteristics. Second, EMCORE K350G machine is designed for easy maintenance. It requires minimal upkeep or tuning adjustments and is designed for maximum up-time. Third, EMITECH K350G tool offers the flexibility of multiple configurations of embedded conditioning ovens, enabling different stages of baking and annealing suitable for various thin film deposition applications. The embedded conditioning ovens enable the asset to achieve higher growth rates than conventional sputtering tools while providing control over film properties. Fourth, K350G model utilizes the magnetron sputtering method, which allows for superior uniformity in thin film deposition than alternative methods. This feature favors the deposition of highly uniform films, resulting in smoother and more consistent films. Finally, KDF / EMITECH / EMCORE K350G equipment is equipped with a full range of process monitoring systems, process automation capabilities, computer control, and environmental controls. These systems ensure a reliable, efficient, and high-quality thin film deposition, eliminating potential process variability. In conclusion, KDF K350G is a high-quality, cost-effective sputtering system suitable for thin film deposition on large-area substrates. It provides superior uniformity for thin film deposition thanks to the use of embedded conditioning ovens and the magnetron sputtering method, as well as excellent environmental and process control systems.
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