Used KOREA VACUUM TECH VTC PVD-1300 #9173159 for sale

ID: 9173159
Sputtering system Chamber fitted (3) LEYBOLD TMP1600 Turbo molecular pumps (1) EDWARDS Roots pump (1) EDWARDS Rotary pump (4) Advanced converters 20K MP 20 (1) ADdvanced converters 18K Bias power supply (2) Mass flow controllers (1) Set rotary cage (1) Magnet power supply PLC with computer Control panel for all controls.
KOREA VACUUM TECH VTC PVD-1300 is a sputtering deposition equipment designed for both thin film coating and advanced research applications. This system utilizes a high-powered, diode-type sputtering source to deposit thin film and will produce coatings with exceptional uniformity and high deposition rates. The unit's Source to Wafer Distance (SWD) is adjustable, allowing for various configurations of target-to-substrate distances for optimal film deposition conditions. The PVD-1300 also has a low energy electron bombardment machine (LEBS) on the electron source, enabling it to deliver high power electron beams with precisely controlled energy levels. This tool is suitable for use with nearly any gas and offers the ability to control the gas pressure within the asset. In addition to its sputtering deposition capabilities, the PVD-1300 is equipped with advanced temperature control systems. Its heating and cooling sources are adjustable from 10 to 300ºC, and they can keep the substrate temperature stable and uniform. Consumers may also utilize the PVD-1300's automated pressure control model to maintain a constant operating pressure within the chamber. KOREA VACUUM TECH PVD-1300 features an intuitive control equipment which provides access to settings and parameters for the sputtering process. It is capable of storing up to 10 preset operating conditions, assisting scientists in quickly setting up the system for immediate use. The PVD-1300 also offers a number of monitoring systems, such as its automatic shutdown feature, to ensure safety during operation and prevent damage to the unit or its components. The PVD-1300 is a powerful and reliable sputtering machine designed to allow for the deposition of thin films with the utmost precision. Its adjustable SWD and temperature control systems provide for optimal film deposition conditions, while its automated pressure control tool provides the convenience of maintaining a constant operating pressure. The PVD-1300 also has preset operating conditions and safety monitoring systems to ensure safe operation. With its powerful features and precise control, KOREA VACUUM TECH PVD-1300 is an excellent choice for thin film coating and advanced research applications.
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