Used KRAUSS MAFFEI Triathlon #9165555 for sale

KRAUSS MAFFEI Triathlon is a sputtering equipment developed by KRAUSS MAFFEI for the deposition of thin films. It has been designed to deposit a range of materials onto substrates of different surfaces, such as glass, metals, plastics and ceramics. The deposition system consists of three magnetically driven sources, each equipped with two targets which may be used for co-sputtering. This allows the deposition of up to three materials in one cycle, enabling the deposition of complex, multi-component structures. In addition, the targets can be easily exchanged to allow for the deposition of a variety of materials, including elemental metals, alloys, oxides and nitrides. Triathlon unit allows for both single-step and multi-step sputtering, depending on the materials and structures desired. The sputter source contains a process chamber which houses the horizontal sputter sources and an electrostatic hexapole which is used to direct the sputtered material to the substrate. The chamber is pressurized to maintain an optimal gas flow for sputtering, and is temperature controlled for a uniform deposition rate. The main source is equipped with a rotating magnetron, while the other two sources may be used for RF or DC biasing. The rate of sputtering is controlled with an adjustable pressure regulator in order to achieve a uniform deposition rate and thickness. The machine is capable of performing sputter etching of processes to repair and modify existing layers or devices. This allows it to be used for a variety of applications such as chemical-mechanical planarization (CMP), oxidation, annealing and implantation. The tool is equipped with a 6-track process repeat parameter for automatic change of deposition parameters and a stepper motor for remote operation. KRAUSS MAFFEI Triathlon is a reliable and efficient sputtering asset which offers precise control over deposition parameters and materials. This allows for the creation of complex multi-component substrates and unique surface structures which are suitable for a variety of applications, including microelectronics, optical coating, thin-film photovoltaic and thin-film transistors. It's compact and low cost also makes it suitable for a variety of laboratory environments.