Used KURT J. LESKER CMS-18 #9183484 for sale

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ID: 9183484
Sputtering system Dual chamber with load lock (3) Cathodes in each chamber PLC Process control Substrates: Up to 8” diameter Substrate rotation Substrate bias, RF & DC Substrate heater: Up to 500°C 3” Magnetron sputter cathodes Process gases: Ar, O2, N2 RF & DC power supplies Co-sputter capability.
KURT J. LESKER CMS-18 is a comprehensive sputtering equipment designed to deposit thin films onto substrates. It is a versatile substrate molecular-beam epitaxy (MBE) platform that allows researchers to perform research and development for a variety of applications. With its advanced capabilities such as high-temperature, high temperature deposition, bi-polarized electron bombardment, and in-situ diagnostics, CMS-18 is an ideal choice for research and industrial production. KURT J. LESKER CMS-18 is composed of several modules including a surveyor stage, a four-pocket source holder, a high temperature quartz substrate boat, a Low Pressure Plasma Source (LPPS), a Gas Flow control system, and an opto-mechanical chamber. The surveyor stage permits the four-pocket source holder to move along with driven axes to arbitrary positions in order to achieve highly precise positioning of the substrate and other components. The four-pocket source holder allows the deposition of four different target materials into the same substrate area. This greatly increases production capability and can reduce production time. The high temperature quartz substrate boat is specifically designed to sustain high temperature thermal processes. It can withstand temperatures up to 1200°C for extended periods of time. Furthermore, the boat is loaded with a quartz or pyrolitic graphite (pg) substrate holder which provides a well-controlled high temperature environment suitable for MBE processes. The LPPS is employed for surface pre-treatment and activation of the substrates. This device enables uniform ion fluxes to the target surface and helps to provide global surface activation for improved film homogeneity. In addition to the LPPS, the gas flow control unit further optimizes parameters of the process. It is used to introduce and maintain the gas pressure in the opto-mechanical chamber. The gas pressure is measure to precisely balance and control the sputtering rate and the deposition process. To maximize the performance of CMS-18 machine, the opto-mechanical chamber is equipped with a viewing window which permits observation and analysis of the thin film deposition in real time. The results are then used to adjust the deposition parameters accordingly for the optimal performance. KURT J. LESKER CMS-18 is a robust and reliable tool that provides a fully automated deposition process suitable for research and industrial manufacturing applications. It offers all the necessary components to create high quality thin films of precisely the desired application. It offers high-temperature operation, improved deposition rates, low energy consumption, and a high degree of precision. With its precision control and flexibility of configuration, CMS-18 is a great choice for applications that require deposition of thin films.
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