Used KURT J. LESKER CMS-18 #9184206 for sale

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ID: 9184206
Sputtering system Dual chamber with load lock (3) Cathodes in each chamber PLC Process control Substrates: Up to 8” diameter Substrate rotation Substrate bias, RF & DC Substrate heater: Up to 500°C 3” Magnetron sputter cathodes Process gases: Ar, O2, N2 RF & DC Power supplies Co-sputter capability.
KURT J. LESKER CMS-18 is a single-station high capacity sputtering equipment specifically designed for reliable and repeatable processes of low temperature sputtering deposition. The system has advanced features to adopt both traditional DC magnetron sputtering and Pulsed-DC (PDC). It is a versatile deposition tool that provides the ability to sputter thin films of metals such as Aluminum, Chrome, Copper, Nickel, Gold and Silver. It is suitable for academic, industrial and research laboratories. CMS-18 unit consists of a single high capacity high voltage power supply to power up the sputter head, a vacuum chamber, a vacuum pump and a set of precise Variable Density Target (VDT) assemblies. The power supply is capable of providing adequate power for up to four independent sputtering heads. The VDT assemblies ensure uniform and consistent sputter deposition uniformity. To control the deposition rate, a variable shuttle lift mechanism is provided that allows for precise uniform target positioning. The vacuum chamber chamber is designed for a maximum operating pressure of 8 mTorr and is suitable for operation in both DC and PDC modes. The large vacuum chamber comes with a top-mounted mounted isolation valve for fast and secure gas isolation when needed or required. The machine also comes with advanced process control features such as temperature and process monitoring. In addition to the sputter process, KURT J. LESKER CMS-18 also supports the common substrate materials such as alumina, silicon, and other deposition materials such as oxides, nitrides, carbides, fluorides, and other materials. The tool also includes a gas delivery asset which further allows for reactive sputtering process. CMS-18 is a highly efficient tool that makes sure that all processes such as the sputtering process are reliable and repeatable, and the uniformity of the film deposited can be dramatically improved. The model comes with a set of user-friendly software providing the operator with real-time information on the operational parameters and the film deposition process. KURT J. LESKER CMS-18 is an excellent and reliable tool that provides solution to different article deposition requirements. In addition to this, it offers great flexibility and control over the process ensuring that the desired parameters and quality film are achieved. With its excellent features, CMS-18 provides a reliable, advanced and versatile low temperature sputtering deposition solution.
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