Used KURT J. LESKER Pro Line PVD 75 #9113549 for sale
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ID: 9113549
Thin film deposition system
Various targets
(2) SS Chamber liners
Turbo pump: 500 l/s
Dry pump upgrade
Torus 3 Sources flange assembly
Torus Source flex mount
KJLC 600W RF Power supply
AE DC Power supply: 1.5 kW
Substrate fixture (Top mount, base unit)
Upstream pressure control
Primary rotation
Recipe driven computer control
TKD 100 Recirculating chiller:
Cooling: 10,000 BTU/hr at 20°C
Condenser: Air-cooled, ambient rating at 90°F
Temperature control range: 5-35°C, ± 1°C
T31H Turbine pump: 6 GPM at 60 PSI
Tank: 2.5 gal
Dimensions: 21½" x 35¾" x 28 5/8"
Connector: 3/4" Female NPT
Interior chamber
Gas tanks & targets
Power: 208/230V, 60 Hz (P2), single phase.
KURT J. LESKER Pro Line PVD 75 is a high-performance sputtering equipment designed for semiconductor production. Its compact layout and automated control features make it an ideal solution for industrial use. It is capable of creating anodic and cathodic coatings of various materials and thicknesses, as well as other substrate modifications. Pro Line PVD 75 integrates a high-power direct current (DC) source, two-dimensional motorized stage, solid-state power supply, and a full control module. The DC power supply range is adjustable from 1.2 to 50 kW, allowing for varying substrate heater temperatures. The motorized stage equipped with a closed-loop digital readout system enables precise and repeatable control of the substrate position. Additionally, an RF generator is used for sputtering process. The process parameters, including substrate temperature, pre-deposition, sputtering DC power, and gas pressure, can be set via the control module, and all the information is displayed digitally. The SPI-75 also includes a load-locked deposition unit and a rotatable target holder. The machine is able to accommodate a variety of target materials and in various sizes. An inert gas delivery tool is also integrated, allowing for the delivery of higher pressures while controlling the level of contamination to a minimum. KURT J. LESKER Pro Line PVD 75 is designed to achieve high-quality deposition over a wide range of applications. The process parameters can be adjusted to optimize the project requirements and to ensure continually high-quality results. The asset is also equipped with a facility for statistical process control, allowing for in-line feedback on yield, quality, and particle contamination. Pro Line PVD 75 is a greatly capable sputtering tool that efficiently and reliably performs a variety of deposition and substrate modification processes. Its high level of automation and sophisticated control functions make it highly efficient while yielding the most consistent results of today's advanced process technology.
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