Used KURT J. LESKER PVD 75 #293608382 for sale

KURT J. LESKER PVD 75 is a vacuum-based thin-film deposition equipment used to produce films of various materials on rigid and flexible substrates. The technology behind this system is called physical vapor deposition (PVD) and allows for the uniform deposition of films that are only a few nanometers thick onto a variety of surfaces. Unlike other forms of deposition, PVD does not require the use of combustible gasses or extreme temperatures, making it the ideal choice for a range of applications in both industrial and scientific settings. PVD 75 features a turbomolecular pump with an ultimate pressure of 1x10-10 Torr and a 2.75 inch conflat chamber. The tungsten filament evaporation source is encased in a stainless steel shutter and is faraday protected to eliminate interference. All electronic parameters can be monitored and adjusted via the touchscreen user interface. KURT J. LESKER PVD 75's process controller enables the user to precisely control the deposition rate and layer thickness, as well as power level and filament current. The unit also includes a film thickness monitor in order to ensure the layer is applied to the desired thickness. In addition, PVD 75 has VersaCote software, which allows the user to create highly precise, dynamic process recipes for different film applications. This software also allows for remote monitoring, allowing the user to check in on the machine without being present. The setup also includes a load-lock chamber, as well as a flat-screen touchscreen viewing window. Overall, KURT J. LESKER PVD 75 is a versatile and precise tool for the application of thin-film materials to surfaces. It is specifically designed to create highly uniform films that are only a few nanometers thick, and to do so without the introduction of combustible gasses or extreme temperatures. The asset's VersaCote software allows for precise control of the deposition process, while its integrated electronic components allow for detailed monitoring and adjustment. PVD 75 is an excellent tool for a range of applications, from industrial to scientific settings, and is an ideal choice for those looking for a precise and efficient thin film deposition model.