Used KURT J. LESKER PVD 75 #293778253 for sale
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ID: 293778253
Vintage: 2006
Physical Vapor Deposition (PVD) system
Vacuum chamber with multiple ultra-high vacuum (UHV) ports
CTI 8200 Compressor
CTI CRYO-TORR 8F Vacuum pump
SIGMA INSTRUMENTS SQC-122C Controller
ULVAC Scroll pump
MAPS Electronic Vacuum Processor (EVP) Power supply
MAPS Ion source controller, 3"
(3) Thermal boat
Connecting cable
No electron beam (E-beam) source
No magnetron
Chamber capacity: 75 liters
2006 vintage.
KURT J. LESKER PVD 75 is a desktop type sputtering equipment specifically designed for conducting thin film coating processes and can be used for both low and high rate applications. It offers an effective platform for users to produce quality metal, ceramic and composite films. This sputtering system consists of a vacuum chamber, processing zone, power supply, and various peripheral components. The vacuum chamber, the main component of PVD 75, consists of a metal crucible and window assembly, backed by a heavy duty ceramic substrate holder. It also includes a unique auto-pumping unit that helps maintain desired pressure levels inside the vacuum chamber. The processing zone includes a control box and a pair of target holders for holding two sputtering sources at once. The internal power supply provides precise power delivery to the sputtering sources, allowing for adjustments to be made according to the type of film being produced. KURT J. LESKER PVD 75 also features an advanced control machine featuring a user-friendly touch screen display that allows directors to control all aspects of the tool with ease. It offers users the ability to manually adjust the bias, performance level, and pressure settings. Additionally, it includes advanced diagnosis and error detection tools to ensure that the process runs smoothly and efficiently. The asset is also compact, lightweight and easily transportable. As such, it can be used for both low and high rate applications, such as producing high quality eyeglass parts or producing components for the aerospace and automotive industries. It is also compatible with a range of other process control systems, allowing for greater customization and optimization of the coating process. Overall, PVD 75 provides a reliable platform for users to conduct a variety of thin film deposition processes. Its user-friendly control model, automated auto-pumping equipment, and robust design ensures that all processes can be completed efficiently and accurately. With its wide range of peripheral components, it offers further options for users to customize and optimize their processes.
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