Used LEYBOLD HERAEUS A550 VZK #9097914 for sale
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ID: 9097914
Wafer Size: 3"
Sputtering system, 3"
Processes: RF Etch, RF sputtering, RF bias sputtering
Chamber size: 590 mm
Throughput: (10) Substrates, 3" Dia per load
Microprocessor controlled
Final vacuum: 5 x 10^-7 mbar
RF Power supplies: IS 7.5 and TIS 1.2
Vacuum chamber:
~24" Diameter
Baffles for pre-sputtering and sputter-etching
Water cooled substrate carrier
Substrate mounting plate
System components:
LEYBOLD System
LEYBOLD Sputtering chamber: ~24” diameter
LEYBOLD RF-Etching, RF sputtering
LEYBOLD Matching network
LEYBOLD RF-Bias, penningvac, medel PMhsz
LEYBOLD TMP450 Turbo pump
LEYBOLD NT450 Controller
LEYBOLD ES 7.5 RF Power supply, 13.56 MHz, huttinger
LEYBOLD Control rack: 18kVA, 35A
LEYBOLD Thermovac TM 220S2
LEYBOLD Penningvac PM 411S2
(2) LEYBOLD ME03 0-10V
(2) LEYBOLD ATP 01 Digital displays
(2) LEYBOLD Auto switches
Display.
LEYBOLD HERAEUS A550 VZK is a sputtering equipment - a type of coating technology used to create uniform, thin film layers on the surfaces of materials. This system is used to deposit high quality, uniform coatings on almost any shape (flat, curved, or complex objects). It is capable of working with a wide range of materials including metals, oxides, semiconductors, organic films, and dielectric materials. A550 VZK sputtering unit is comprised of several components, including cathode (the source of sputtering material), substrate (the material to be sputtered upon) power supplies, and a vacuum enclosure. The cathode is typically made of the same material as the coating that is being sputtered, and is placed in the sputter chamber and activated. Substrate materials are placed on a sputter stage, where high voltage power supply unit is used to create an electric field in order to accelerate electrons towards the cathode material. When the electrons strike the cathode material, they ionize the material and create an ion bombardment, which physically expels material atoms into the vacuum chamber. Once these atoms reach the substrate, they deposit a thin coating of the desired material. The thickness of the deposited layer can be accurately controlled by varying the ion energy, the angle at which the substrate is located, and the length of time that the sputtering process is carried out. LEYBOLD HERAEUS A550 VZK sputtering machine is highly reliable and versatile, allowing for quick and efficient deposition of coatings on a variety of materials. It requires relatively low power consumption, and is easily portable. The tool is specifically designed to provide a low environmental impact, with the use of liquid nitrogen cooled targets to maintain a relatively high working temperature. Overall, A550 VZK sputtering asset is an ideal choice for producing uniformly thin film layers on a variety of materials. It provides an efficient and highly reliable deposition process for a wide range of materials, and is ideal for both small and large scale production runs.
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