Used LEYBOLD HERAEUS Z550 #131001 for sale

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ID: 131001
Semi-automatic cathode sputtering system Includes: (Qty 2) PK150 magnetron sputtering cathodes: 6" diameter Cathodes for DC and RF DRESSLER Caesar 2.5 kW RF sputtering power supply DRESSLER VM 3000 automatic matching unit GS30 / 800 ADL DC sputtering power supply, 3 kW Substrate table with water cooling and RF-bias / RF-etching Gas inlet system with mass flow controller Second gas inlet is prepared LEYBOLD D-60A prevacuum pump LEYBOLD Turbovac 450 turbomolecular pump with LN2-baffle.
LEYBOLD HERAEUS Z550 sputtering equipment is a high-performance, low-cost tool for vacuum deposition of thin films. It is designed for the precise and controlled deposition of various materials on substrates of various sizes and shapes. The system is capable of depositing material layers from 10 to 100 nm thick and can be used for physical vapor deposition (PVD) of thin films on a variety of substrates and materials. LEYBOLD HERAEUS Z 550 has a number of features which make it an optimal choice for high-precision PVD applications. It includes a modern, closed-loop unit with a 200mm x 200mm design area, which makes it ideal for larger substrates. The chamber has a temperature range of up to 200°C, which allows for temperature control and uniformity over the entire substrate. In addition, the machine has a high-precision gas delivery tool so that gases can be accurately introduced and controlled. HERAEUS Z550 includes a number of other features which make it particularly suitable for PVD applications. It has a high-vacuum pumping unit which enables high-precision, low-vacuum deposition. The asset can also be configured for dual-stage deposition, meaning that two different process steps can be carried out in a single cycle. This allows for thicker layers to be deposited, as well as thinner layers of different materials. LEYBOLD HERAEUS HERAEUS Z550 also features a precisely controlled calibration and alignment model, which ensures consistent quality of deposition for each cycle. This helps to reduce variation and ensures uniformity in the film thickness across different substrates. It also helps to reduce the possibility of any damage to the substrates from impurities or ignition of the gases used in PVD. In addition, the equipment is fully automated and comes with a user-friendly interface, which makes it easy to set up, operate and control. Finally, Z550 is a cost-effective choice for high-precision PVD applications. It offers a comprehensive package of features without breaking the bank, making it a smart option for anyone looking to deposit a variety of thin films onto a variety of substrates.
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