Used LEYBOLD HERAEUS Z550SS #9105299 for sale

LEYBOLD HERAEUS Z550SS
ID: 9105299
Sputtering system.
LEYBOLD HERAEUS Z550SS is a dc/RF dual magnetron-based physical vapor deposition (PVD) sputtering equipment. It utilizes two magnetron sources for sputtering processes that deposit thin films on the substrate, resulting in excellent conformal coating with precise control over profile shape and uniformity. The sputtering system is composed of four process chambers—a large process chamber with a 6"×6"×8" (152 mm×152 mm×203 mm) window size and three much smaller chambers specially designed for optimal process yield and minimum cross-contamination. The process chambers also have a gas outlet connection, allowing for process gases to be supplied directly from an external source. The unit utilizes independent gas supply systems for both the process chambers and the in-situ cleaning, ensuring efficient control over process parameters that yield consistent results. Z550SS sputtering machine features a high-power ion source with a long lifetime and high gas pressures for efficient sputtering. It also uses an advanced digital RF power control for precise control over the deposition rate, maximum ion current, and uniformity of profile coverage. The tool is equipped with a data processing asset that provides in-depth analysis of the deposition process and enables the user to optimize deposition parameters. Moreover, the model includes an automatic temperature control equipment for efficient deposition at optimum substrate temperature. LEYBOLD HERAEUS Z550SS sputtering system is designed for easy operation, with intuitive software, a programmable automatic control panel, and clear LED indicators for quick visual reference. Furthermore, it is designed for compatibility with other sputtering systems, allowing the user to exchange information regardless of the unit's make or model. With its powerful features and versatile software, Z550SS is an ideal sputtering machine for efficiently depositing thin films with precise control over profile shape and uniformity.
There are no reviews yet