Used LEYBOLD HERAEUS Z650 #27258 for sale
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ID: 27258
Sputtering system equipped with load lock / exit chamber with Leybold Trivac D65B prevacuum pump, Leybold Turbovac 1000 turbo molecular pump, and RF plasma cleaning. Process chamber A with Alcatel 2063 prevacuum pump and Pfeiffer TMH1001P turbodrag pump (TMH is as good as new), 3 x new PK 200 sputtering cathodes positions, RF and DC sputtering power supply, (combined with process chamber B), Balzers QMG064 massaspectrometer; Process chamber B with Leybold Trivac D65B prevacuum pump, Leybold Turbovac 1000 turbo molecular pump, 2 x new PK 200 sputtering cathodes positions, 1x substrate heating position, RF and DC sputtering power supply, (combined with process chamber A), RF bias, Balzers QMG064 massaspectrometer, can be retrofitted to your specs.
LEYBOLD HERAEUS Z650 is a sputtering equipment used for thin film deposition. This system is highly versatile, and can be used for a variety of materials, such as oxides, nitrides and metals. The unit consists of an ultra-high vacuum chamber, a magnetron cathode and an Embedded Vacuum Process Controller (EVPC). The machine can accommodate up to two targets for sputtering, and can be used for both DC and pulsed DC sputtering. LEYBOLD HERAEUS Z 650 has a range of features to ensure process stability, repeatability and precision. These features include: a micro-processor based embedded vacuum process controller (EVPC) with a 5.7" screen and touch pad user interface; a triple turbo-molecular pumping station with a fore pump device; a closed cycle cooling tool with a built-in cooler; and an auto-positioning asset which ensures repeatable sputtering results. Z650 offers an impressive number of process parameters, allowing the user to customize the model to their specified needs. To achieve repeatable and precise results, the equipment offers a precise flow control system, adjustable high voltage, a precise pressure transducer unit and precise targets placement. The machine also has the capacity to use high temperature alloys for targets, allowing for the deposition of the most challenging films. Z 650 offers a number of additional features, such as a plasma monitor, an anti-stick device and a high-frequency sputtering monitor. The tool also features an accurate deposition monitor, to ensure the precise and consistent deposition of films. The anti-stick device allows films to be removed from difficult to clean surfaces with ease. The high-frequency sputtering monitor ensures a thorough and uniform deposition of films. LEYBOLD HERAEUS Z650 is a highly versatile and precise sputtering asset, capable of depositing films of various materials. With its many features, such as the closed loop cooling model, the precise targets placement, the high-frequency sputtering monitor and the plasma monitor, the equipment is designed to provide excellent control over process parameters. This system is ideal for manufacturers who need precise and reliable sputtering processes.
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