Used LK TECHNOLOGIES NGI 3000 #137797 for sale

ID: 137797
Ion gun Cleans surfaces in a high or ultra-high vacuum environment by means of noble gas ion sputtering Comes with NGI 3000-SE control unit Control cables Manual.
LK TECHNOLOGIES NGI 3000 is a viable sputtering equipment designed to evenly deposit thin films on a substrate with high uniformity and consistency. It has the latest sputtering technologies that make it one of the best products in its category. NGI 3000 is based on a multi-axis robotic platform and incorporates advanced components for reliable and precise sputter deposition. It features a unique aerodynamically design which maximizes cooling efficiency and reduces the heat generated during the sputtering process. This leads to reduced thermal cracking and uneven film deposition. With this unique design, LK TECHNOLOGIES NGI 3000 provides improved performance and better efficiency than other sputtering systems in the market. NGI 3000 utilizes three cathode regions to deposit films on a wide variety of substrates. It also has two independent voltage supplies for the cathode and substrate for precise control of the sputter rates and film thickness. The adjustable-speed robotic arm coating system enables high deposition accuracy and uniformity. LK TECHNOLOGIES NGI 3000 can be operated in manual or automatic mode and is compatible with both low and high-temperature processes. In addition, the unit has a user-friendly graphical interface which allows operators to easily set up parameters and monitor machine functions, including gas control, target power, and total output. Other features of NGI 3000 include a compact size, variable substrate size options, maintenance free operation, and easy installation. LK TECHNOLOGIES NGI 3000 is ideal for both research and production applications. It is a reliable and efficient method for thin film deposition on a wide range of substrates. With its advanced features and unique design, NGI 3000 is a powerful and cost-effective solution for any sputtering application.
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