Used MAGNETRON SHS-2M-3-400TL #9221750 for sale

MAGNETRON SHS-2M-3-400TL is a MAGNETRON sputtering equipment designed for a variety of physical vapor deposition (PVD) applications. The system is made up of a two-stage MAGNETRON, a 3-position rotating target, and a 400 mm diameter planar target. MAGNETRON is a two-stage design, consisting of a primary stage and a secondary stage. The primary stage consists of an externally cooled, magnetically shielded high-powered DC discharge MAGNETRON. This type of MAGNETRON is best suited for sputtering deposition of thin film materials such as metal alloys and oxides. The secondary, anode-less Fine Pitch MAGNETRON is used for controlled etching or sputtering of small target areas. It has a high-power RF source and a planar flange to support the target. The 3-position rotating target is used for performing multi-layer sputtering and coating. The sputtering unit uses a patented hybrid sputtering method to achieve superior deposition rates and uniformity. The 400 mm diameter planar target is used for larger-area deposition. It can deposit a wide range of materials, from metal alloys and oxides to nitrides and carbides. SHS-2M-3-400TL sputtering machine features an independent control interface, allowing the user to control all parameters of the sputtering process. The tool also includes an electric boom for easy, ergonomic positioning of the target. The asset is enclosed in an airtight chamber to prevent contamination of the sputtering process and maximize deposition efficiency. In addition, the model has a built-in interlock safety equipment to ensure safe and secure operation. MAGNETRON SHS-2M-3-400TL is perfectly suited for a wide range of PVD applications, including photovoltaic cells, LED lighting, tool coatings, and other advanced coatings. The system is designed to provide superior film properties with precision, high deposition rates, and superior uniformity. The advanced technology ensures consistent, high-quality coatings and a superior return on investment.