Used MEIVAC / ALCATEL / COMPTECH 2460 HEDA #9203525 for sale

MEIVAC / ALCATEL / COMPTECH 2460 HEDA is a highly-versatile sputtering equipment used for a variety of applications including semiconductor and display manufacturing. It is tailored for the production of thin-film deposition resulting in high-purity boron nitride and diamond-like carbon layers. This system is capable of generating a broad spectrum of target materials for deposition, such as silicon oxides, nitrides, and carbides, in addition to other materials with the ability to perform processes such as sputter etching, reactive sputtering, and ion implantation. MEIVAC 2460 HEDA has the ability to deposit up to 15 wafers at a time, enabling its users to save time and increase throughput. It also makes high-quality, high-performance crystal films. Its advanced technologies such as magnetron sputtering help to increase controllability and improve precise and even coating. The sophisticated process control and monitoring systems of this unit enable users to monitor, diagnose, and modify their deposition processes in real time. ALCATEL 2460 HEDA makes use of its four independent high-density ion sources, as well as its four-cluster high-current power source, to ensure the highly efficient aluminizing process and target coating, thus resulting in high-quality deposition of thin films. The machine also has in-situ monitoring and data logging capabilities which enable users to adjust the substrate temperature, chamber pressure, and bias voltage to ensure accurate result. This tool is also very user-friendly, making it easy to program different materials and processes. 2460 HEDA has also been designed to meet the highest environmental standards and reduce energy usage. It has been tested to meet the requirements of leading environmental accreditation organizations such as UL, CSA, and CE. This asset is also equipped with advanced safety features such as automatic shut-off in case of power failure or faulty operation. Overall, COMPTECH 2460 HEDA is an advanced sputtering model that provides excellent performance and deposit quality. It is ideal for a wide variety of applications and its sophisticated process control and monitoring systems enable users to produce high-accuracy thin film deposition results. This equipment is ideal for users looking for high precision results in an efficient and energy-saving manner.