Used MEIVAC / ALCATEL / COMPTECH 2460 #50094 for sale

ID: 50094
Sputtering system, turbo and cryo pump replaced Electrical rack with original operating system (window 2000 and Wonderware with GE 90-30) SST Chamber with motor drive lid Four pockets He backside 6" wafer notch (or custom) 10 KW/Matching Network RFPP for target 2 KW/Matching Network RFPP for substrate He backside gas with pressure control Pumping: Turbo pump and water pump package with ISO 250 Flange. QDP40 Dry Pump foreline 17” Target backing plate Currently disassembled and in parts.
MEIVAC / ALCATEL / COMPTECH 2460 sputtering equipment is a semiconductor metallization system designed to deposit extremely thin layers of metal films at low temperatures onto various substrate materials. This unit uses partial pressures of process gases and a negative DC sputtering power supply to generate highly uniform films with tight control of surface roughness and thickness. The sputtering machine utilizes a unique shape to form films perfectly tailored for advanced semiconductor device fabrication. MEIVAC 2460 offers exceptional control and flexibility over the structure and composition of the thin film layers. These layers are produced using high purity Reactant Gases and a triode cathode-plasma best suited for low temperature and fine line metallization. The plasma is formed by applying a high voltage through a reaction chamber filled with the reactant gases, creating an ion-rich environment ideal for thin film deposition. ALCATEL 2460 sputtering tool is equipped with a rotating substrate table. This allows for high throughput and is adjustable for both angular and radial positions. This ensures uniformity and repeatability of the thin film layers across all substrates. COMPTECH 2460 is further equipped with a chamber edge-on shuttered gas injector for higher sputtering rates. 2460 produces extremely uniform films by strictly controlling the flux profile on the substrate, resulting in low charging effects, good adhesion and significantly improved shelf lifetime. Furthermore, MEIVAC / ALCATEL / COMPTECH 2460 has a highly uniform negative DC power supply, offering excellent target erosion control and adjustment of sputtering power to substrate mapping. It also features an advanced process gas tank, so that optimal purity and pressure of the process gas can be maintained during its operation. MEIVAC 2460 sputtering asset has many applications, including OLED fabrication, thin film transistors, magnetic recording media, plasmonic and optoelectronic devices. Thanks to its advanced control and flexibility, ALCATEL 2460 offers unbeatable performance, reliability and customizable options.
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