Used MEIVAC / ALCATEL / COMPTECH 98747ASSY9451503-10 #293663534 for sale
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ID: 293663534
Vintage: 2002
Vacuum subsystem assembly
LEYBOLD SV16 Oil sealed vacuum pump
2002 vintage.
MEIVAC / ALCATEL / COMPTECH 98747ASSY9451503-10 Sputtering Equipment is a reliable and efficient thin-film deposition tool used in a variety of industrial sectors. The system consists of a target chamber, a heating source, a vacuum pump, an anode, a deposition chamber, a substrate holder, and a sputtering material. The target chamber is a hard-walled chamber that provides an environment in which the sputtering process can occur. It is comprised of a vacuum pump and heat source that allow the deposition chamber to reach the required temperatures and pressures. The anode is an electrical device that gives off sufficient power to initiate the sputtering process. Inside the deposition chamber, the substrate holders are used to hold the desired substrate onto which the metal or other material will be deposited. Once the substrate is placed, the sputtering material is introduced and the temperature inside the chamber is heated until the desired temperature is reached. Once the substrate is heated, the desired material, such as gold, tungsten, titanium, aluminum or oxide films, is sputtered onto the substrate. The sputtering material is either evaporated from a target material or atomized to a gas. The target material is placed in the chamber and then bombarded with a beam of positively charged atoms. The impact of the bombard atomization creates an atom cascade that sputters the target material onto the substrate. The temperature in the chamber is controlled so that a uniform deposition of the metal or oxide layer is achieved. MEIVAC 98747ASSY9451503-10 sputtering unit is capable of producing precision thin-film depositions quickly, reliably, and accurately. This machine provides manufactures with a high level of quality control, ensuring that the desired films have been deposited correctly. The tool also provides the ability to efficiently modify the deposition rate, allowing for fine tuning of the rate at which the thin-film depositions are applied. Overall, ALCATEL 98747ASSY9451503-10 sputtering asset is an ideal choice for many thin-film deposition applications, providing outstanding performance and reliability at a reasonable cost. This model ensures high-quality thin-film depositions are achieved quickly, accurately, and consistently. As a result, it is a great choice for those looking for precision thin-film applications such as optical coating, microelectronic devices, and microelectronics packaging.
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