Used MRC 602 #9008360 for sale

MRC 602 is a multi-functional sputtering equipment manufactured by Wenzhou Keda Vacuum Technology Co., Ltd. It is designed to deposit thin films of coating materials on substrates. The system consists of an ultra-high vacuum base tank, two sputtering chambers, two bake chambers, and a multi-color ethernet operating unit. The ultra-high vacuum base tank is used to pre-pump the sputtering chamber and bake chamber to a vacuum level of less than 10-4 Pa. This vacuum is then isolated from the base tank to create separate independent chambers. The two sputtering chambers are equipped with seven layer vacuum-resistant stainless steel baffles, allowing precision control over the ultra-high vacuum conditions. The chambers are also equipped with an active cooling machine for even heating/cooling during sputtering processing. The dual sputtering chambers are equipped with 13-position high-power magnetron sputtering sources. These sputtering sources are capable of producing deposition rates from 0.05 to 10 nanometers per minute, allowing precision thin-film coating of substrates. In addition, the sources are equipped with an independent AC power source, allowing both high and low power settings to be adjusted for increased flexibility and stability. The two bake chambers are used for elevating the substrate temperature up to 300°C during sputtering processing. This allows greater control over the temperature and also allows a greater number of sputtering materials to be processed. The bake chambers are also equipped with a thermocouple feedback control tool, which allows faster and more precise temperature control during sputtering processes. Finally, the multi-color ethernet operating asset is used to control the sputtering model. This includes precision control of the sputtering sources, the bake chamber temperature, and the ultra-high vacuum base tank. This enables the user to quickly and easily customize the equipment settings to meet their particular needs. Overall, 602 is an advanced, highly versatile sputtering system. Its features and precise control ensure accurate thin-film deposition of coatings on substrates. In addition, its use of advanced technologies such as ultra-high vacuum, high-power magnetron sputtering sources, and thermocouple feedback control systems, ensures superior performance and reliability.