Used MRC 603 I #9107596 for sale

MRC 603 I is a sputtering equipment designed for use in the areas of microelectronics, Flat panel display and related thin film engineering. The system integrates multiple sputter sources and a high-performance plasma processor to produce high-quality thin film coatings with excellent uniformity. The unit features a single target sputtering chamber, dual magnetron sputtering heads and an in-chamber arc source. The sputtering chamber can accommodate up to 8 inch (203mm) diameter wafers and multiple features built into the machine allow for easy loading and unloading of substrates. 603 I tool offers a wide range of sputtering target materials, from precious metals, such as gold and platinum, to conductive and semiconductive materials such as aluminum, cobalt and chromium. The dual head magnetron features independent control of power level, bias voltage, and temperature, allowing for precise and accurate thin film deposition. The arc source, using argon as the working gas, provides exceptional control over the plasma environment, allowing for precise control over film surfaces and properties. MRC 603 I offers a wide range of process flexibility. The RF power, pulse frequency, and duty cycle of the sputtering can be independently controlled for both target sources, making it easy to optimize the deposition process for each material. The in-chamber arc source allows for the creation of highly reactive species for surface modifications and nitriding. It also provides a way to enhance the adhesion of the film to the substrate without the need for additional chemical processes. 603 I features sophisticated process control software for monitoring and recording sputtering parameters in real-time. This allows for easy identification of process issues and precise process control. Additionally, the asset includes advanced data analysis capabilities, which allow for fine-tuning of the process parameters to achieve optimal thin film performance. The software also allows for easy data transfer and storage capabilities, making it easy to share film data and develop and customize sputtering processes. Overall, MRC 603 I is a high-performance sputtering model that is designed and configured to meet the needs of microelectronics, Flat panel display and other thin film engineering applications. With its wide range of target materials, powerful arc source, and advanced software monitoring capabilities, 603 I offers excellent thin film deposition with high uniformity and repeatability.