Used MRC 603 II #293647878 for sale

Manufacturer
MRC
Model
603 II
ID: 293647878
Sputtering system (3) Cathodes Cryo pump Gasses: Argon, Oxygen Wafer configuration: 16 x 3 inches 9 x 4 inches 5 x 5 inches 4 x 4 inches.
MRC 603 II is a sputtering equipment developed by the manufacturing company Oerlikon Leybold Vacuum. It is a robust tool designed for repetitive industrial processing and sputtering of up to four different materials in a single run. This makes it ideal for a wide range of applications including thin films, coatings, and protective coatings. MRC 603-II has two different modules, a cathode source and a target chamber, which are both connected to a single power supply. This allows the system to be operated in both pulsed and constant current. The cathode source module is made up of two chambers: one for the sputtering cathode and the other for the heated substrate. The target chamber is designed to sputter up to four different materials simultaneously and has an integrated turbo pump for faster processing time. 603 II is an extremely efficient unit, capable of producing products of high quality and uniformity. Its vacuum control machine also helps to ensure a clean working environment, giving users peace of mind that their products won't be adversely affected by the presence of residual particles. In addition to its efficiency, 603-II is also highly user-friendly. Its user interface has been designed to make it easy to operate, with a variety of settings to allow users to tailor their tool according to their individual needs. There are a range of optional extras also available, such as metal and ceramic targets, that can be added in order to expand the range of applications. Overall, MRC 603 II is a reliable and effective sputtering asset, suitable for a range of uses. Its ease of use, efficiency, and flexibility make it a popular choice among those looking to take advantage of its full range of features.
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