Used MRC 603 III #9248081 for sale

MRC 603 III is a Vacuum Based Sputtering Equipment designed and manufactured by the Oxford Instruments. It is an advanced physical vapor deposition (PVD) system that is used for the deposition of thin films in semiconductor and related industries. MRC 603-III is an eight-chamber magnetron sputtering unit that is fully integrated and optimized for high quality coating performances. It features a unique dual-state magnetron sputtering gun configuration, which helps to maximize thin film quality. The machine also includes a load-lock chamber, a high-performance turbo-molecular-pump (TMP), and an integrated vacuum process monitoring tool. It is capable of sputtering various materials at high deposition rates and offers superior coverage of large area applications. 603 III uses a variety of high-performance reactive gases and target materials for deposition. The asset is equipped with electro magnetic shields and can accommodate up to four magnetrons at a time. 603-III incorporates a wide range of proprietary process control technologies, such as advanced temperature control, gas flow control, and enhanced homogeneity of deposited material. The model also ensures maximum repeatability of deposition process through automated substrate loading and unloading, and consistent substrate to substrate repeatability. Along with a wide selection of temperature, speed, pressure, and vacuum control measures, MRC 603 III offers excellent process consistency and provides high-quality deposition processes for a variety of substrates, such as metal, plastic, glass, ceramic, and other specialty materials. Moreover, the equipment features advanced subsystem control, monitoring and diagnostics capabilities. All the process parameters can be easily monitored, providing accurate data about the system performance and process condition at any given time. MRC 603-III also features advanced touchscreen Human-Machine Interface (HMI) for data input, process monitoring, unit diagnostics, and process control. In conclusion, 603 III is an advanced cost-effective sputtering machine that provides superior thin film performance. With its strong feature set, the tool is highly suitable for large area deposition and producing high-quality thin films with repeatable process results.