Used MRC 603 #166780 for sale

MRC 603 is a magnetron sputtering equipment developed by Advanced Energy Industries, Inc. for use in the deposition of thin films. This system is equipped with two DC magnetron sources, which generate dynamic cross-field magnetron sputtering by employing the Langmuir-Child law. Through this process, particles of the target material are sputtered and collide with a substrate, resulting in the formation of a thin film on the substrate. 603 unit is designed to handle a variety of substrates, including metals and semi-insulating materials. It offers the benefits of low power consumption, reduced machine cost and increased sputter deposition rate. This tool has a built-in automated end-point detection and control asset, which eliminates the need for manual monitoring of the sputtering process. MRC 603 can be configured with two ultraviolet (UV) light sources that provide a steady, high intensity light output. This light is then focused on the deposition target by a projection lens. Through this process, the target material is exposed to the UV light and is then sublimated in the form of a vapor cloud and deposited onto the substrate. 603 model provides flexibility in the choice of deposition parameters and allows for the optimization of process conditions during film deposition. An oxygen flow equipment can also be added to the system to encourage faster deposition rates. Additionally, the unit allows for the inclusion of a variety of ion sources, such as morganite, titanium-platinum and carbon-dioxide (CO2). These features and capabilities of MRC 603 machine make it an ideal choice for the deposition of thin films. The high degree of control, accuracy, flexibility and cost effectiveness make this tool attractive for a variety of deposition applications. The ability to handle multiple substrate materials and to perform precise and reproducible film deposition provide users with improved performance in their thin film processes.