Used MRC 603 #293628797 for sale

MRC 603
Manufacturer
MRC
Model
603
ID: 293628797
Sputtering system CTI-CRYOGENICS 10 Cyropump Turbo pump on load lock (3) Magnetron Spare parts.
MRC 603 is a fully automated sputtering equipment designed for physical vapor deposition (PVD) of thin films. It is designed for operations and processes ranging from research to production. The powerful sputtering system is suitable for any application requiring a smooth, uniform and precise deposition of materials with high repeatability. 603 has six cathodes that can be configured with different material types, allowing the PVD process to be tuned to a wide range of requirements. The unique design of MRC 603 allows for multiple cathode configurations ranging from stationary configurations to rotational configurations. The unit is also capable of biasing, allowing substrates to be processed with maximum efficiency and speed. 603 has an onboard plasma generator, which is suitable for reactive sputtering. This process is highly recommended to achieve a reliable and uniform deposition. The advanced software suite of MRC 603 allows for precise sputtering parameters to be set and controlled, thus ensuring uniform films of high quality. The robust design of 603 allows for high power operation, enabling the deposition of thicker films with higher throughput. This machine is uniquely designed to make use of a programmable controller to drive process parameters and operations, allowing for easy customization and repeatability. For efficient deposition of films at high sputtering rates, MRC 603 has a fully automated substrate heating/cooling tool embedded in its design. This allows for accurate control of the substrate temperature to achieve repeatable films with a high level of uniformity. 603 can be customized to a wide range of applications, with various interlocks and safety systems embedded within its design. This ensures operator safety during the processing of sensitive substrates and high purity films. MRC 603 is a versatile, dependable and innovative sputtering asset. Not only is it suitable for use in research applications, but its abundance of features make it ideal for use in production as well. High end applications, such as film stack assemblies, can take advantage of the precise, repeatable and precise films 603 is able to deposit.
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