Used MRC 603 #293658459 for sale

MRC 603 sputtering equipment is a magnetically-enhanced, low-emission, extremely high vacuum-operated device used to deposit thin-film microstructures on to substrates while minimizing damage and contamination through ultra-low pressure operation. At its core, 603 system consists of a 3-inch chamber and molybdenum magnetron sputterer, with a DC power supply, controller and mass flow controller to maintain optimal process conditions. This unit is specifically designed to deposit materials with a high purity and uniformity to maximize device performance, while providing control over process parameters, such as substrate temperature and sputter rate, to easily modify film properties. In addition, its low-emission design ensures minimal sputter yield loss and a cleaner environment. The machine uses a direct-current reactive sputter source, consisting of a built-in magnet and an electron beam gun, to deliver controlled particle bombardment, resulting in a uniform, highly-stable film deposition. The magnet directs the ion flow towards the substrate, which is held in a concentric position in relation to the magnetron sputtering head, and helps to disperse the energetic particles evenly across the substrate's surface. By controlling the sputtering power and pressure, the tool can deposit materials with a consistent grain structure and optimal material characteristics. The asset is outfitted with a variety of safety features, such as a vacuum pump interlock and emergency stop, to ensure safe operation. It also includes a viewing window and a remote video camera with a monitor, so users can observe the process in real-time. MRC 603 sputtering model is suitable for a broad range of applications in both research and industrial settings and is ideal for creating thin-film microstructures. It is an efficient, low-cost solution for creating high-quality films with consistent properties.