Used MRC 603 #293761946 for sale

MRC 603 is a sputtering equipment used for the deposition of thin films. It employs a direct-current, planar magnetron source that uses a permanent magnet to generate a directed plasma stream. The sputtering system is equipped with a variable-power rf source to provide additional ion energy control. 603 is a compact unit, capable of producing film deposition rates up to 1000 nm/min on substrates up to 8 inches (203 mm) in diameter. The machine is equipped with a heated cathode, a prime vacuum chamber, a 4-quadrant mass flow controller, an interlock tool, a shutter and a clamp. The heated cathode is the main element in MRC 603 that determines the quality of the resulting thin-film deposition. It uses a temperature-controlled heater and computer-controlled temperature sensors to maintain the right temperature and ensure a uniform, consistent deposition results. The prime vacuum chamber is a cylindrical chamber with a slit on the side facing the sputter target. This chamber is designed to maintain a demanding clean environment for the deposition process. It has a baffled bottom to enhance uniform pumping, and a low vacuum exhaust ring to reduce overall pressure and protect the substrate from contamination. The 4-quadrant mass flow controller is used to regulate the individual components of the active sputtering gas mixture and to maintain the optimum conditions for the deposition process. The interlock asset monitors atmospheric pressure, substrate temperature, sputtering power and gasses. A shutter and clamp model allow for access to the sputtering area for preparation and removal of the substrate. The shutter automatically opens when the rf generator is on and closes as the power is shut off. The clamp is used to keep the substrate in position and to facilitate the substrate exchange with minimum downtime. 603 is a highly reliable, robust and efficient sputtering equipment used in a wide variety of thin-film deposition applications. It is easy to setup and offers precise control of the geometrical parameters necessary to achieve uniform and reproducible thin-film deposition results.