Used MRC 603 #9008357 for sale

MRC 603 is a sputtering equipment designed for thin film deposition, capable of both magnetic and direct current sputtering of high-quality materials. The system is equipped with a 200 mm magnetron cathode, which allows for precise and repeatable sputtering in both directions. The unit features a vacuum chamber capable of accommodating substrates up to 6 inches in diameter and up to one inch in thickness, with a base pressure of less than 5×10-6 Torr. Its operation is controlled by a touch panel PC with built-in software, which simplifies and allows users to set parameters such as power supply voltage, gas flow control, plasma parameters and other associated parameters for precise control of the sputtering process. The main components of the machine are a power supply, vacuum chamber, cathode with anode, target, backing plate and shield. 603 provides an easy to use platform to deposit high quality films over a range of materials. It is capable of sputtering both positive and negative ions, from both single and dual angle sources, allowing for more precise and directional sputtering. The tool also includes an independent secondary electron gun that provides control of the deposition angle of the ion beam, providing the ability to create thicker and smoother film deposits over a range of materials. The asset provides precise digital control of all parameters including target distance, sputter pressure, power, voltage and other related parameters. The chamber is also equipped with a high performance turbomolecular pump that can be used to reduce deposition time and achieve higher film qualities. The sputtering model also features an in-situ cleaning process that provides control over the deposition rate and film quality. The equipment is equipped with an automatic substrate centering and pumping station, allowing for a very low level of target-to-substrate distance for precise and repeatable sputtering. MRC 603 is designed to provide reliable sputtering of a wide range of materials for both research and industry. Its high accuracy, repeatability, and flexibility make it suitable for use in a variety of applications, from thin film coatings, to optical and biomedical devices, to the deposition of superconductors, optical materials, and more.