Used MRC 603 #9082895 for sale

MRC 603 is a sputtering equipment designed for use in a range of professional industries. This system is composed of several components allowing for the simultaneous deposition of metal films onto a substrate. Its main component is an R&D sputtering tool, which consists of a triode magnetron-style cathode and an anode. The cathode is equipped with titanium, chromium, and aluminum metal crucibles. The metal is heated to sputtering temperatures, creating energetic ions that are directed onto the substrate. Along with the sputtering tool, the unit includes an evaporator cone and a vacuum chamber. The evaporator cone is used to bring a small non-metallic compound, such as silicon or oxygen, into the vacuum chamber and evaporate it onto the substrate. The vacuum chamber is used to maintain a low-pressure environment in order to increase the rate of deposition. 603 also boasts a number of features to enhance the sputtering process. The anode is designed to independently control the fast and slow power supply of the cathode, allowing you to fine-tune the rate of deposition. Additionally, the machine is equipped with a micrecording pressure gauge, which allows for precise pressure control inside the chamber. An RF generator is included to channel the power into the magnetron cathode, which speeds up the sputtering rate. Finally, there is a configurable shutter to control the deposition rate on thin films. MRC 603 achieves excellent uniformity and repeatability with its wide selection of materials and adjustable parameters. This tool is especially useful for large-scale production or for achieving specialized coatings on a variety of different substrates. It is also known for its low power usage, making it cost-effective and environmentally friendly. All of these features make 603 an ideal sputtering asset for a variety of industries.