Used MRC 603 #9269412 for sale

MRC 603 is a sputtering equipment designed for thin film deposition. It is a high vacuum, high power and versatile platform for sputtering thin films in both DC and RF modes. 603 features a single electron guns and two powerful magnetron sputter sources capable of producing both planar and cylindrical targets. The system utilizes a turbo-pumped high-vacuum chamber with a base pressure better than 5x10-5 Torr, enabling ultra high vacuum conditions. The user-friendly controllers that support both manual and automatic operation provide an intuitive and easy operation and control for MRC 603. The unit includes process parameters such as temperature, pressure, deposition rate and film thickness. It also features other advanced features such as frequency adjustment, pulse sputtering and selectable processes. 603 has two Planar Magnetron Control Units which enable the user to control four planar magnetron sputter targets at different temperatures. These units feature the end of operation detector which can stop the sputtering process when the desired film thickness is reached. The Concentrated Ion Beam (CIB) source provides capability to sputter materials with precision and accuracy. It features two adjustable working distances with manual or automatic mode control. The CIB is capable of producing high-quality films of alloys and other materials. The multi-chamber operation support on MRC 603 allows up to three chambers to be interconnected and operated in tandem, or for separate processes to take place in each chamber altogether. This is an advantageous feature for users who require several-step depositions. 603 provides an adjustable RF power source for external matching network control of the magnetron sputter sources. The DC power source allows the user to set the voltage for the electron gun and protects the machine from over-voltage or over-current situations. MRC 603 is an excellent choice for cost-effective and high quality thin film deposition for various applications. Its versatility and user-friendly interface make it suitable for research as well as industrial thin film processing.