Used MRC 603 #9272191 for sale

MRC 603 is a well-known sputtering equipment suitable for depositing thin films for various applications in the electronics, optoelectronic and display industries. It is often regarded as an integral part of thin film deposition, a deposition process that involves introducing thin layers of material onto a target substrate in order to improve the properties of the target. 603 is an advanced sputtering system, distinguished by the use of multiple magnetrons for film deposition. The unit was designed to promote homogenous and repeatable global composite thin films. It consists of a bell jar chamber, housing one or two magnetic levitating rotating sputtering source assemblies. An ultrahigh vacuum guarantees cleanliness and high yield. The advanced technology of MRC 603 enables it to reach repeatable deposition rates up to 15nm/min in double-target mode, or up to 10nm/min in single-target mode. 603 can accommodate substrates at sizes of up to 350 mm in diameter. It also features a state-of-the-art control computer that is capable of quick sputtering time selection and repeatable rate control. The control computer also allows users to adjust any of the process parameters in real-time to attain optimum machine performance for any deposition requirement. The tool also includes advanced safety features such as a pressure safety interlock to ensure the safety of the substrate and the asset under process conditions. It also has the ability to detect high power states and prevent arcing. Other features include powerful gas control systems to enable inert and reactive or in-situ treatments. The model also offers exceptional chamber cleanliness - typically below 1E-9T, achieved by the combination of a mobile chamber dipole and a cold trap equipment. This is especially important in the case of optical coatings. Furthermore, with its advanced rotating HPR magnetic levitating source assemblies, the system provides high ionization efficiency and deposition uniformity. All in all, MRC 603 is an advanced sputtering unit suitable for the deposition of multiple thin film materials in the electronics, optoelectronic and display industries. Its advanced features, such as repeatable rates, adjustable process parameters, chamber cleanliness, and safety systems ensure that depositions are homogenous and repeatable, and that the process is reliable and safe.