Used MRC 603 #9286006 for sale

MRC 603 is a high-performance sputtering equipment designed specifically for large-scale production of thin film materials. This integrated chamber is ideal for applications such as solar cell production, Flexible OLED devices and flat panel displays. The system is comprises of a compact and compact sputter source, motorized rotational target scanner with up to 160 degree scanning range, RF/DC power supplies with adjustable power and programmable setpoints, substrate heaters, temperature controllers, and gas distribution manifold. The high power RF/DC power supplies enable high deposition rates and uniform sputter deposition onto the substrates. The motorized rotational target scanner allows precise control of the deposition area and offers a wide range of customizable substrate size configurations. Furthermore, the temperature controllers and substrate heaters guarantee uniform temperature distribution, enabling a higher quality, more uniform film deposition. 603 is equipped with a well-designed vacuum unit, featuring an innovative turbo-based design, robust gas seal, and high-quality modular components. This allows for a process chamber pressure range of 10E-7 to 1000 millitorr, with high speed pump down cycle times. The machine also includes a reliable mass flow controller, ensuring accurate gas flow and pressure regulation. The intuitive user-friendly touch screen menu tool makes it easy to program and adjust parameters and enables recipe setting and transfer from multiple sources. The remote diagnostic capability provides real-time monitoring and allows process tecnhicians to keep track of process conditions. The reliable and robust mechanical design of MRC 603 complies with the highest standard safety protocols in industrial processes, such as EMC compliance. It is designed for trouble-free operation and minimal maintenance, with its reliable and superior performance, 603 Sputtering Asset offers exceptional value for large production runs.